主要特点：

刻蚀用陶瓷环材质为高纯氧化铝陶瓷 、氧化锆陶瓷及碳化硅陶瓷，具有硬度高，耐磨损、精度保持性好，很好的耐等离子体轰击特性。并且高纯高性能工程陶瓷材料能够很好的解决新一代刻蚀技术中等离子体腐蚀、微粒产生、金属污染和氧气分解等问题。

Main features

Ceramic rings for etching are made of high purity alumina ceramics, zirconia ceramics and silicon carbide ceramics. They have

high hardness, good wear resistance, good accuracy and good resistance to plasma bombardment. Moreover, high purity and high performance engineering ceramics can solve the problems of plasma corrosion, particle generation, metal pollution and oxygen decomposition in the new generation of etching technology.

应用领域：

主要用于LED 衬底材料、半导体材料及外延材料的等离子刻蚀设备中，对设备刻蚀腔体的很好的防护作用。

Application

It is mainly used in plasma etching equipment of LED substrate material, semiconductor material and epitaxy material. I t has a good protective effect on etching cavity of equipment.

规格型号：

根据用户需求，可设计和制造各种标准及非标准的陶瓷环产品。

Specification:

According to user requirements, various standard and non-standard tool holders can be designed and manufactured.